ISO/TC 201/SC 8 - Glow discharge spectroscopy

This document specifies a glow discharge optical emission spectrometric method for the determination of the thickness and mass per unit area of single and metallic nanolayers on iron-based substrates. This method is applicable to single and metallic nanolayers, 10 nm to 100 nm thick, on iron-based substrates. The metallic elements of the layers are Cr, Ni, Ti, Mn and Al. Other elements that can be determined according to this document are P and S.

This document provides guidelines that are applicable to bulk and depth profiling GD-OES analyses. The guidelines discussed herein are limited to the analysis of rigid solids, and do not cover the analysis of powders, gases or solutions. Combined with specific standard methods which are available now and, in the future, these guidelines are intended to enable the regulation of instruments and the control of measuring conditions. Although several types of glow discharge optical emission sources have been developed over the years, the Grimm type with a hollow anode accounts for a very large majority of glow discharge optical emission devices currently in use both for dc and rf sources. However, the cathode contact is often located at the back of the sample, in e.g. the Marcus type source, rather than at the front as in the original Grimm design. The guidelines contained herein are equally applicable to both and other source designs and the Grimm type source is used only as an example.

This document gives procedures for the operation and use of glow discharge mass spectrometry (GD-MS). There are several GD-MS systems from different manufacturers in use and this document describes the differences in their operating procedures when appropriate. NOTE This document is intended to be read in conjunction with the instrument manufacturers' manuals and recommendations.

This document describes a glow-discharge optical-emission spectrometric method for the determination of the thickness, mass per unit area and chemical composition of metal oxide films. This method is applicable to oxide films 1 nm to 10 000 nm thick on metals. The metallic elements of the oxide can include one or more from Fe, Cr, Ni, Cu, Ti, Si, Mo, Zn, Mg, Mn, Zr and Al. Other elements that can be determined by the method are O, C, N, H, P and S.

ISO 16962:2017 specifies a glow-discharge optical-emission spectrometric method for the determination of the thickness, mass per unit area and chemical composition of metallic surface coatings consisting of zinc- and/or aluminium-based materials. The alloying elements considered are nickel, iron, silicon, lead and antimony. This method is applicable to zinc contents between 0,01 mass % and 100 mass %; aluminium contents between 0,01 mass % and 100 mass %; nickel contents between 0,01 mass % and 20 mass %; iron contents between 0,01 mass % and 20 mass %; silicon contents between 0,01 mass % and 15 mass %; magnesium contents between 0,01 mass% and 20 mass%; lead contents between 0,005 mass % and 2 mass %, antimony contents between 0,005 mass % and 2 mass %. NOTE Due to environmental and health risks, lead and antimony are avoided nowadays, but this document is also applicable to older products including these elements.

ISO 11505:2013 describes a glow discharge optical emission spectrometric (GD-OES) method for the determination of the thickness, mass per unit area and chemical composition of surface layer films. It is limited to a description of general procedures of quantification of GD-OES and is not applicable directly for the quantification of individual materials having various thicknesses and elements to be determined.

ISO 14707:2015 provides guidelines that are applicable to bulk and depth profiling GD-OES analyses. The guidelines discussed herein are limited to the analysis of rigid solids, and do not cover the analysis of powders, gases or solutions.

ISO/TS 25138:2010 describes a glow-discharge optical-emission spectrometric method for the determination of the thickness, mass per unit area and chemical composition of metal oxide films. The method is applicable to oxide films 1 nm to 10 000 nm thick on metals. The metallic elements of the oxide can include one or more from Fe, Cr, Ni, Cu, Ti, Si, Mo, Zn, Mg, Mn and Al. Other elements that can be determined by the method are O, C, N, H, P and S.

ISO/TS 15338:2009 gives guidelines for the operation of glow discharge mass spectrometry (GD‑MS) instruments and recommendations for the use of GD‑MS. It is intended to be read in conjunction with the instrument manufacturers' manuals and recommendations.

ISO 16962:2005 specifies a glow discharge optical emission spectrometric method for the determination of the thickness, mass per unit area and chemical composition of metallic surface coatings consisting of zinc- and/or aluminium-based materials. The alloying elements considered are nickel, iron, silicon, lead and antimony. This method is applicable to zinc contents between 0,01 mass % and 100 mass %; aluminium contents between 0,01 mass % and 100 mass %; nickel contents between 0,01 mass % and 20 mass %; iron contents between 0,01 mass % and 20 mass %; silicon contents between 0,01 mass % and 10 mass %; lead contents between 0,005 mass % and 2 mass %; antimony contents between 0,005 mass % and 2 mass %.